Nitrogen Trifluoride (NF3) Babban Tsabtataccen Gas
Bayanan asali
| CAS | 7783-54-2 |
| EC | 232-007-1 |
| UN | 2451 |
Menene wannan kayan?
Nitrogen trifluoride (NF3) iskar gas mara launi kuma mara wari a zafin daki da matsa lamba na yanayi. Ana iya shayar da shi ƙarƙashin matsakaicin matsa lamba. NF3 yana da karko a ƙarƙashin yanayin al'ada kuma baya rubewa da sauri. Duk da haka, yana iya rushewa lokacin da aka fallasa shi zuwa yanayin zafi mai zafi ko kuma a gaban wasu abubuwa masu kara kuzari. NF3 yana da babban yuwuwar dumamar yanayi (GWP) lokacin da aka sake shi cikin yanayi.
Inda za a yi amfani da wannan kayan?
Wakilin tsaftacewa a cikin masana'antar lantarki: NF3 ana amfani dashi sosai azaman wakili mai tsaftacewa don cire gurɓataccen gurɓataccen abu, kamar oxides, daga saman semiconductor, bangarorin nunin plasma (PDPs), da sauran abubuwan lantarki. Yana iya tsaftace waɗannan saman yadda ya kamata ba tare da lalata su ba.
Etching gas a cikin masana'anta na semiconductor: Ana amfani da NF3 azaman iskar gas a cikin aikin masana'anta na semiconductor. Yana da tasiri musamman a cikin etching silicon dioxide (SiO2) da silicon nitride (Si3N4), waɗanda kayan aikin gama gari ne da ake amfani da su wajen ƙirƙira haɗaɗɗun da'irori.
Samar da mahadi masu tsafta mai tsafta: NF3 tushe ne mai mahimmanci na fluorine don samar da mahadi iri-iri masu ɗauke da fluorine. Ana amfani dashi azaman mafari a cikin samar da fluoropolymers, fluorocarbons, da sinadarai na musamman.
Ƙirƙirar Plasma a cikin masana'antar nunin lebur: Ana amfani da NF3 tare da sauran iskar gas don ƙirƙirar plasma a cikin samar da nunin panel, kamar nunin kristal mai ruwa (LCDs) da PDPs. Plasma yana da mahimmanci a cikin jigogi da ayyukan etching yayin ƙirƙirar panel.
Lura cewa takamaiman aikace-aikace da ƙa'idodi don amfani da wannan kayan/samfurin na iya bambanta ta ƙasa, masana'antu da manufa. Koyaushe bi jagororin aminci kuma tuntuɓi gwani kafin amfani da wannan abu/samfurin a kowace aikace-aikace.
